Process Equipment : Ion Sources

Magnetrons

Veeco brings its vast ion beam experience to our Isoflux Cylindrical Magnetrons (ICM). These sputtering sources use cylindrical targets to surround the substrate with coating materials. Used to coat complex 3-dimensional shapes, wires and fibers the ICM design is more efficient than planar magnetrons and offers high deposition rates, excellent target utilization, less downtime and relatively inexpensive targets. Veeco offers the following Isoflux Cylindrical Magnetrons: ICM-516; ICM-522-UHV; ICM-1921; and ICM-3421.