Process Equipment : Ion Beam Etch

NEXUS IBE-350Si Ion Beam Etching System

The NEXUS IBE-350Si Ion Beam Etching System was designed to be the process match to the legacy RF350S tools.  This improved system utilizes the same ion source, grids, fixtures and source-to-substrate geometry on a more reliable platform.  Process Performance of the NEXUS IBE-350Si will match that of the legacy RF-350S tools.  The IBE-350Si is based on Veeco's next generation NEXUS platform. Key benefits of this system are improved control system, reduced floor space and it is field upgradeable to the NEXUS-420Si Ion Source.