Metrology & Instrumentation
Process Equipment
Epitaxial Equipment
Epitaxial Equipment : MBE Sources
Specialty
Atom-H Source
This source is a high-temperature thermal cracker designed to crack H2 into atomic H for substrate cleaning and during MBE growth.
This source is a high-temperature thermal cracker designed to crack H2 into atomic H for substrate cleaning and during MBE growth.
Gas Crackers/Injectors
This source is designed for UHV delivery of gases requiring thermal cracking before arriving at the substrate, featuring a customized exit cone and endplate to optimize flux uniformity.
This source is designed for UHV delivery of gases requiring thermal cracking before arriving at the substrate, featuring a customized exit cone and endplate to optimize flux uniformity.
Low Temp Gas Source
This source is a cost-efficient solution to introduce a source gas without thermal pre-cracking.
This source is a cost-efficient solution to introduce a source gas without thermal pre-cracking.
UNI-Bulb RF Plasma Source for Nitrogen and Oxygen
These sources are designed to provide unrivaled plasma stability and reproducibility, allowing many hours of run time without source re-tuning.
These sources are designed to provide unrivaled plasma stability and reproducibility, allowing many hours of run time without source re-tuning.